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Providing high resolution in high-volume manufacturing, ASML’s extreme ultraviolet (EUV) lithography systems are pushing Moore’s Law forward. Discover our NXE systems that use EUV light to deliver high-resolution lithography and make mass production of the world’s most advanced microchips possible.
2022年3月30日 · Four decades, billions in R&D, a vital merger, thousands of people around the world: bringing EUV lithography to high-volume manufacturing was an immense effort. Learn about the pivotal moments that happened on the way to launching ASML’s first EUV
2024年1月25日 · What is High NA EUV lithography? High NA EUV is the next step in our constant pursuit of shrink. Like NXE systems, it uses EUV light to print tiny features on silicon wafers. And by turning the NA knob, we deliver even better resolution: The new platform
EUV lithography, a technology entirely unique to ASML, uses light with a wavelength of 13.5 nanometers. This wavelength is more than 14 times shorter than DUV light. EUV light occurs naturally in outer space. But to make EUV lithography possible, we needed to engineer a way to create such light within a system.
The EUV lithography solutions provided by the TWINSCAN NXE:3600D are complementary to those provided by our TWINSCAN NXT systems based on ArF immersion technology. The NXE platform uses 13.5 nm EUV light, generated by a tin-based plasma source, to expose 300 mm wafers with a max exposure field size of 26 mm x 33 mm.
The dual-stage extreme ultraviolet (EUV) lithography system is the first in a new generation of machines that will provide 8 nm resolution to support advanced Logic and Memory chip production. Saved jobs
ASML在台灣設有極紫外光 (EUV)及深紫外光系統 (DUV) 訓練中心，提供工程師和客戶相關訓練，確保他們獲得正確的技能、流程和知識，來進行疑難排解並維護我們的產品。
ASMLでは、現在、開口数(NA)を0.55にまで引き上げた「High-NA」次世代EUVリソグラフィプラットホームの開発を進めています。 このプラットホームでは、光学系の設計が一新され、ステージの移動速度も一段と速くなっています。
ASML and imec open joint High NA EUV Lithography Lab offering an early development platform to the leading-edge semiconductor ecosystem. ASML gives the world's leading chipmakers the power to mass produce patterns on silicon, helping to make computer chips smaller, faster and greener.
2022年9月14日 · ASML has been using pellicles for a long time in DUV (deep ultraviolet) lithography systems, but the stakes were raised when we developed EUV lithography technology. To transmit light of just 13.5 nanometers, the EUV pellicle had to be thinner and be able to withstand much higher temperatures inside the machine.
