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Extreme ultraviolet lithography (EUVL, also known simply as EUV) is a technology used in the semiconductor industry for manufacturing integrated circuits (ICs). It is a type of photolithography that uses extreme ultraviolet (EUV) light to create intricate patterns on silicon wafers.
Extreme ultraviolet radiation (EUV or XUV) or high- energy ultraviolet radiation is electromagnetic radiation in the part of the electromagnetic spectrum spanning wavelengths shorter than the hydrogen Lyman-alpha line from 121 nm down to the X-ray band of 10 nm.
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The Extreme ultraviolet Imaging Telescope ( EIT) is an instrument on the SOHO spacecraft used to obtain high-resolution images of the solar corona in the ultraviolet range. The EIT instrument is sensitive to light of four different wavelengths: 17.1, 19.5, 28.4, and 30.4 nm, corresponding to light produced by highly ionized iron (XI ...
EUVE was a part of NASA's Explorer spacecraft series. Launched on 7 June 1992. With instruments for ultraviolet (UV) radiation between wavelengths of 7 and 76 nm (equivalent to 0.016–0.163 keV in energy), the EUVE was the first satellite mission especially for the short-wave ultraviolet range.
Portable ultraviolet lamp. UV radiation is also produced by electric arcs. Arc welders must wear eye protection and cover their skin to prevent photokeratitis and serious sunburn. Ultraviolet (UV) light is electromagnetic radiation of wavelengths of 10–400 nanometers, shorter than that of visible light, but longer than X-rays.
Electron beam lithography was most popular during the 1970s, but was replaced in popularity by X-ray lithography during the 1980s and early 1990s, and then by EUV lithography from the mid-1990s to the mid-2000s. Focused ion beam lithography has carved a niche for itself in the area of defect repair.
Ultraviolet photography is a photographic process of recording images by using radiation from the ultraviolet (UV) spectrum only. Images taken with ultraviolet radiation serve a number of scientific, medical or artistic purposes. Images may reveal deterioration of art works or structures not apparent under light.
